![]() | Study programme 2017-2018 | Français | |
![]() | Plasma Technology for the Treatment of Materials | ||
Programme component of Master's Degree in Chemistry Research Focus à la Faculty of Science |
Code | Type | Head of UE | Department’s contact details | Teacher(s) |
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US-M2-CHIMFA-013-M | Optional UE | SNYDERS Rony | S882 - Chimie des Interactions Plasma-Surface |
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Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Credits | Weighting | Term |
---|---|---|---|---|---|---|---|---|---|
| Français | 15 | 12 | 15 | 0 | 0 | 3 | 3 | 1st term |
AA Code | Teaching Activity (AA) | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term | Weighting |
---|---|---|---|---|---|---|---|---|
S-CHIM-120 | Plasma Technology for the Treatment of Materials (Part A) | 15 | 0 | 15 | 0 | 0 | Q1 | |
S-CHIM-150 | Plasma Technology for the Treatment of Materials (Part B) | 0 | 12 | 0 | 0 | 0 | Q1 |
Programme component |
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Objectives of Programme's Learning Outcomes
Learning Outcomes of UE
At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies
Content of UE
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Prior Experience
Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces
Type of Assessment for UE in Q1
Q1 UE Assessment Comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Type of Assessment for UE in Q3
Q3 UE Assessment Comments
Written exam using the course notes. Reading and discussion around a research paper related to the course.
Type of Resit Assessment for UE in Q1 (BAB1)
Q1 UE Resit Assessment Comments (BAB1)
Not applicable
Type of Teaching Activity/Activities
AA | Type of Teaching Activity/Activities |
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S-CHIM-120 |
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S-CHIM-150 |
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Mode of delivery
AA | Mode of delivery |
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S-CHIM-120 |
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S-CHIM-150 |
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Required Reading
AA | |
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S-CHIM-120 | |
S-CHIM-150 |
Required Learning Resources/Tools
AA | Required Learning Resources/Tools |
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S-CHIM-120 | Slides containing the figures are available |
S-CHIM-150 | none |
Recommended Reading
AA | |
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S-CHIM-120 | |
S-CHIM-150 |
Recommended Learning Resources/Tools
AA | Recommended Learning Resources/Tools |
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S-CHIM-120 | Not applicable |
S-CHIM-150 | None |
Other Recommended Reading
AA | Other Recommended Reading |
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S-CHIM-120 | B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press |
S-CHIM-150 | Not applicable |