![]() | Study programme 2024-2025 | Français | |
![]() | Technologie plasma pour le traitement des matériaux | ||
Programme component of Master's in Physics (MONS) (day schedule) à la Faculty of Science |
Code | Type | Head of UE | Department’s contact details | Teacher(s) |
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US-M1-SCPHYS-019-M | Optional UE | SNYDERS Rony | S882 - Chimie des Interactions Plasma-Surface |
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Language of instruction | Language of assessment | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Credits | Weighting | Term |
---|---|---|---|---|---|---|---|---|---|
| Français | 20 | 0 | 15 | 0 | 0 | 3 | 3.00 | 1st term |
AA Code | Teaching Activity (AA) | HT(*) | HTPE(*) | HTPS(*) | HR(*) | HD(*) | Term | Weighting |
---|---|---|---|---|---|---|---|---|
S-CHIM-120 | Plasma Technologies for the Treatment of Materials (Part A) | 20 | 0 | 15 | 0 | 0 | Q1 | 100.00% |
Programme component |
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Objectives of Programme's Learning Outcomes
Learning Outcomes of UE
At the end of the course the student will be able to: - Describe the specificities of cold plasma - Describe the operation of a magnetron discharge - Describe the operation of a PECVD process - Explain the mechanisms involved in the synthesis of thin films by plasma technologies
UE Content: description and pedagogical relevance
Description of the plasma environment, characteristics of cold plasma, magnetron sputtering (reactive), pulsed methods, PECVD processes, plasma polymerization, thin film growth
Prior Experience
Kinetic theory of gases , electricity, atomic structure , statistical distributions , electromagnetic spectrum, diffusion phenomenon , crystal structure of solids, spectroscopic characterization of surfaces
Type of Teaching Activity/Activities
AA | Type of Teaching Activity/Activities |
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S-CHIM-120 |
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Mode of delivery
AA | Mode of delivery |
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S-CHIM-120 |
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Required Learning Resources/Tools
AA | Required Learning Resources/Tools |
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S-CHIM-120 | Slides containing the figures are available |
Recommended Learning Resources/Tools
AA | Recommended Learning Resources/Tools |
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S-CHIM-120 | Not applicable |
Other Recommended Reading
AA | Other Recommended Reading |
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S-CHIM-120 | B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley & Sons D. L. Smith, Thin Films Deposition, McGraw-Hill, Inc. M. Ohring, Materials Sciences of Thin Films, Academic Press |
Grade Deferrals of AAs from one year to the next
AA | Grade Deferrals of AAs from one year to the next |
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S-CHIM-120 | Unauthorized |
Term 1 Assessment - type
AA | Type(s) and mode(s) of Q1 assessment |
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S-CHIM-120 |
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Term 1 Assessment - comments
AA | Term 1 Assessment - comments |
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S-CHIM-120 | Written exam using the course notes. Reading and discussion around a research paper related to the course. |
Resit Assessment - Term 1 (B1BA1) - type
AA | Type(s) and mode(s) of Q1 resit assessment (BAB1) |
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S-CHIM-120 |
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Term 3 Assessment - type
AA | Type(s) and mode(s) of Q3 assessment |
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S-CHIM-120 |
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Term 3 Assessment - comments
AA | Term 3 Assessment - comments |
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S-CHIM-120 | Oral presentation and discussion about a research paper related to the course. |